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Abstract for the talk by Dr. T. Kawaharamura (KUT) 2/18/H27
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A Multiple Quantum Well Fe2O3/Ga2O3 Fabricated Under Atmospheric Pressure by Mist Chemical Vapor Deposition Based on Leidenfrost Effect

Development of quantum device, such as quantum well and topological insulator, has been getting more active. The thin film fabrication processes, such as MBE and MOCVD, which enable control of precursor materials in an atomic scale, are often employed in order to prepare the quantum devices. Especially, migration of precursor materials on the surface is one of the most important for preparing the high crystalline and excellent homogeneous thin film using these processes. For example, a high orientation and satisfactory crystalline GaAs thin film can be prepared at the temperature of 600‡C by MBE [1,2]. However, high temperature is required for increasing migration length because migration length decreases with temperature decrease [3,4]. In order to enable preparation of the high crystalline thin film at low temperature, the method of using a surfactant such as bismuth (Bi) or antimony (Sb) has been developed. Anyway, at least, the high temperature above 400‡C is required.
Incidentally, mist CVD is one of the functional thin film fabrication techniques under open-air atmospheric pressure using solution precursor. So, this method is an environmental friendly process. It is very innovative, if the quantum device can be prepared by such technology.
Recently, high quality thin film can be grown by mist CVD [5]. This is because precursor materials react in vapor phase by Leidenforst effect, that is, ?super migration? over 10 cm is promoted in the reaction field [6]. Thus, fabrication of multiple quantum well Fe2O3/Ga2O3 was attempted by mist CVD. As a result, it succeeded in fabrication of 20QW by mist CVD at the temperature of 400‡C, which was supported by TEM image and XRD measurement. This means the high quality thin films and the high performance devices can be prepared not only by the MBE and MOCVD but by the environmental friendly technique such as mist CVD.
We would like to report in detail and discuss it in the meeting.

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